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Effect of annealing treatment on the structure and properties of the nanograined TiN coatings produced by ultrasonic-based coating process

✍ Scribed by S. Romankov; Y. Hayasaka; N. Hayashi; E. Kasai; S. Komarov

Book ID
116605825
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
530 KB
Volume
495
Category
Article
ISSN
0925-8388

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Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 1C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl 2 ΓΎ 2H 2 O