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Effect of annealing temperature on surface morphology and mechanical properties of sputter-deposited Ti–Ni thin films

✍ Scribed by Lei Zhang; Chaoying Xie; Jiansheng Wu

Book ID
116600447
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
896 KB
Volume
427
Category
Article
ISSN
0925-8388

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Effects of thermal annealing on structur
Effects of thermal annealing on structural and electrical properties of sputtered W–Ti thin films
✍ S. Petrović; D. Peruško; B. Gaković; M. Mitrić; J. Kovač; A. Zalar; V. Milinović 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 421 KB

In this work we have studied the influence of thermal annealing on the structural and electrical properties of W-Ti thin films, deposited on n-type (100) silicon wafers. The films were deposited by d.c. sputtering from a 90:10 wt.% W-Ti target, using Ar ions, to a thickness of ~170 nm. After deposit