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Effect of annealing temperature on structural and electrical properties of tantalum nitride thin film resistors deposited on SiO[sub 2]∕Si substrates by dc sputtering technique

✍ Scribed by Cuong, Nguyen Duy ;Phuong, Nguyen Mai ;Kim, Dong-Jin ;Kang, Byoung-Don ;Kim, Chang-Soo ;Yoon, Soon-Gil

Book ID
121820989
Publisher
AVS (American Vacuum Society)
Year
2006
Tongue
English
Weight
530 KB
Volume
24
Category
Article
ISSN
0734-211X

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