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Effect of an interfacial oxide layer in the annealing behaviour of Au/a-Si:H MIS photodiodes

✍ Scribed by H. Águas; L. Pereira; I. Ferreira; A.R. Ramos; A.S. Viana; J. Andreu; P. Vilarinho; E. Fortunato; R. Martins

No coin nor oath required. For personal study only.

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