Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition

✍ Scribed by Escobar-Alarcón, L.; Solís-Casados, D.A.; Romero, S.; Fernández, M.; Pérez-Álvarez, J.; Haro-Poniatowski, E.

• Book ID: 121685674
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 540 KB
• Volume: 283
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2013.07.023