Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha
✦ LIBER ✦
Effect of AlP on the eutectic nucleation in Ni–38 wt.%Si alloys
✍ Scribed by Yuying Wu; Xiangfa Liu; Xiufang Bian
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 738 KB
- Volume
- 427
- Category
- Article
- ISSN
- 0921-5093
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