Effect of additional gas on diamond deposition by DC PACVD

✍ Scribed by Jae-Kap Lee; Young-Joon Baik; Kwang Yong Eun

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 911 KB
• Volume: 209
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/0921-5093(95)10143-8

✦ Synopsis

The effect of the addition of Ar and nitrogen gas on the deposition of diamond using a direct current (DC) plasma of CH c H 2 gas mixture is investigated, The DC plasma is generat:d by applying a voltage between 820 and 900 V and the resulting current is between 5,5 and 6 A, The addition of Ar makes th: plasma unstable and is limited to 5'/i, owing to the plasma extinction at higher Ar concentrations. Growth rate and non-diamo ld carbon content in the diamond film increase with the Ar amount slightly irrespective of deposition temperature. An optical emi~sion spectrum shows the increase of emission of C 2 and CH while showing a constant average electron energy of the plasma. On he contrary, by adding nitrogen, the morphology is changed to a ball-like diamond shape as well as growth rate of diamond film is decreased abruptly. The optical emission intensities of C 2 and hydrogen also show an abrupt drop with the nitrogen addition. The role of plasma species in the deposition behaviour of diamond is also discussed.