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ECR plasma etching of GaN, AlN and InN using iodine or bromine chemistries

✍ Scribed by Abernathy, C.R.; Vartuli, C.B.; Pearton, S.J.

Book ID: 118137327
Publisher: The Institution of Electrical Engineers
Year: 1994
Tongue: English
Weight: 251 KB
Volume: 30
Category: Article
ISSN: 0013-5194
DOI: 10.1049/el:19941350

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