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Early stages of oxygen aggregation and thermal donors in silicon annealed under hydrostatic pressure

✍ Scribed by V. V. Emtsev Jr; C. A. J. Ammerlaan; B. A. Andreev; V. V. Emtsev; G. A. Oganesyan; A. Misiuk; C. A. Londos

Book ID: 110299005
Publisher: Springer US
Year: 2001
Tongue: English
Weight: 248 KB
Volume: 12
Category: Article
ISSN: 0957-4522
DOI: 10.1023/a:1011251101905

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## Abstract Silicon is the dominant material in electronic industry. Its use for various applications requires processing stages, important among them those involving thermal treatments. Such treatments in Si trigger the mechanisms of oxygen aggregation resulting in the formation of oxygen precipit