๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Dynamical study of the Ar+ ion-enhanced Cl2/GaAs s(110) etch rate phenomenon

โœ Scribed by Lisa A DeLouise

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
264 KB
Volume
43
Category
Article
ISSN
0042-207X

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

The study of GaAs reactive ion etching i
The study of GaAs reactive ion etching in Cl2/Ar
โœ AE Dulkin; VZ Pyataev; NO Sokolova; SA Moshkalyov; AS Smirnov; KS Frolov ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 429 KB