Chemical vapour etching of silicon and p
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Ben Jaballah, A. ;Hassen, M. ;Hajji, M. ;Saadoun, M. ;Bessais, B. ;Ezzaouia, H.
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Article
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2005
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John Wiley and Sons
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English
β 171 KB
## Abstract In this work, we used HNO~3~/HF Vapour Etching (VE) of silicon (Si) wafers for the formation of different porous structures. Depending on the volume ratio of the HNO~3~/HF acid mixture, we can obtain Porous Silicon (PS) layers or a (NH~4~)~2~SiF~6~ like powder phase. These two kind of p