## Abstract In this work, we used HNO~3~/HF Vapour Etching (VE) of silicon (Si) wafers for the formation of different porous structures. Depending on the volume ratio of the HNO~3~/HF acid mixture, we can obtain Porous Silicon (PS) layers or a (NH~4~)~2~SiF~6~ like powder phase. These two kind of p
Chemical vapour etching-based porous silicon and grooving: Application in silicon solar cells processing
✍ Scribed by M. Ben Rabha; M. F. Boujmil; M. Saadoun; B. Bessaïs
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 170 KB
- Volume
- 2
- Category
- Article
- ISSN
- 1862-6351
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