Dry etching properties of methyl-BCN film with C4F8 gas for Cu/low-k interconnection

✍ Scribed by Aoki, Hidemitsu; Hara, Makoto; Masuzumi, Takuroh; Ahmed, Farid; Kimura, Chiharu; Sugino, Takashi

• Book ID: 121917332
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 524 KB
• Volume: 19
• Category: Article
• ISSN: 0925-9635
• DOI: 10.1016/j.diamond.2010.01.025