Dry etching of polysilicon with high selectivity using a chlorine-based plasma in an ECR reactor

✍ Scribed by K.M. Chang; T.H. Yeh; S.W. Wang; C.H. Li; J.Y. Yang

• Book ID: 113300684
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 477 KB
• Volume: 45
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/0254-0584(96)80042-3