Dry etch properties of IZO thin films in a CF4/Ar adaptively coupled plasma system

✍ Scribed by Jong-Chang Woo; Chang-Il Kim

• Book ID: 113940958
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 880 KB
• Volume: 86
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/j.vacuum.2011.12.020