Dry and wet etching properties of thermally grown silicon dioxide layer after N+ ion implantation and annealing

✍ Scribed by Kazuhiro Kudo; Shigekazu Kuniyoshi; Kuniaki Tanaka

• Book ID: 113283536
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 244 KB
• Volume: 80-81
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(93)90727-n