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Dose-dependent thermal oxidation of Ge+-implanted silicon

✍ Scribed by Khalid Hossain; O.W. Holland; F.U. Naab; L.J. Mitchell; P.R. Poudel; J.L. Duggan; F.D. McDaniel

Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 204 KB
Volume: 261
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2007.04.240

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