Distribution profiles of boron-implanted layers in silicon using a high resolution anodic oxidation cell : K. V. Anand, A. H. G. El-Dhaher and M. I. Sobhy. Int. J. Electronics40 (6), 617 (1976)

• Publisher: Elsevier Science
• Year: 1976
• Tongue: English
• Weight: 131 KB
• Volume: 15
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(76)90591-6