Disorder profiles in silicon at high sputtering dose by profiling the oxide growth rate

✍ Scribed by Kisielewicz, Mikołaj

• Book ID: 126604710
• Publisher: Informa UK (Taylor & Francis)
• Year: 1984
• Weight: 355 KB
• Volume: 80
• Category: Article
• ISSN: 0033-7579
• DOI: 10.1080/00337578408222491