✦ LIBER ✦

Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties

✍ Scribed by Bong Kuk Lee; Tomoji Kawai; Bong Hyun Chung

Book ID: 102933932
Publisher: John Wiley and Sons
Year: 2010
Tongue: English
Weight: 539 KB
Volume: 11
Category: Article
ISSN: 1616-5187
DOI: 10.1002/mabi.201000362

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✦ Synopsis

Abstract

A free‐radical‐polymerizable SSQ/PEG blend with direct patternability has been proposed as an ideal nonfouling material for nanostructure‐based biomedical applications. Cured SSQ/PEG networks show an UV transparency of >90% at 365 nm, high resistance to organic/aqueous solutions, hydrophilicity and Young's moduli of 1.898–2.815 GPa. SSQ/PEG patterns with 25‐nm linewidths, 25‐nm spacing, and an aspect ratio of 4:1 were directly fabricated on transparent substrates by UV embossing, and cured SSQ/PEG networks with long‐term stability under chemical, thermal, and biological stress showed strong resistance to the nonspecific adsorption of biomolecules. These characteristics may offer a new strategy for the development of a number of medical nanodevice applications such as labs‐on‐a‐chip.
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