𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Digital moiré fringe measurement method for alignment in imprint lithography

✍ Scribed by Jinyou Shao; Yucheng Ding; Hongmiao Tian; Xin Li; Xiangming Li; Hongzhong Liu

Book ID
113831764
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
544 KB
Volume
44
Category
Article
ISSN
0030-3992

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A Moiré method for high accuracy alignme
A Moiré method for high accuracy alignment in nanoimprint lithography
✍ M. Mühlberger; I. Bergmair; W. Schwinger; M. Gmainer; R. Schöftner; T. Glinsner; 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 684 KB

Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative