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Diffusion versus oxidation rates in silicon-germanium alloys

✍ Scribed by Eugène, J.; LeGoues, F. K.; Kesan, V. P.; Iyer, S. S.; d’Heurle, F. M.


Book ID
121266655
Publisher
American Institute of Physics
Year
1991
Tongue
English
Weight
716 KB
Volume
59
Category
Article
ISSN
0003-6951

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