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Diffusion study of plasma ion implanted H in silicon

✍ Scribed by T. Som; R. Rakshit; V.N. Kulkarni

Book ID: 114171852
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 113 KB
Volume: 161-163
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(99)00824-1

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