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Diffusion and reactions of interstitial oxygen species in amorphous SiO2: A review

✍ Scribed by Koichi Kajihara; Taisuke Miura; Hayato Kamioka; Akira Aiba; Motoko Uramoto; Yukihiro Morimoto; Masahiro Hirano; Linards Skuja; Hideo Hosono

Book ID
116670707
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
291 KB
Volume
354
Category
Article
ISSN
0022-3093

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Diffusion of Sr, Bi, and Ta in amorphous
Diffusion of Sr, Bi, and Ta in amorphous SiO2
✍ Ralf BΓΌngener; Werner Pamler; Ulrich GΓΆsele πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 178 KB

Diffusion of Sr, Bi, and Ta in SiO 2 was studied to determine diffusion coefficients and diffusion mechanisms of these elements in the amorphous material. Technological motivation is the introduction of strontium bismuth tantalate (SBT) as ferroelectric material for nonvolatile memories. Diffusion f