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Dielectric properties of Zr–Sn–Ti–O thin films prepared by pulsed laser deposition

✍ Scribed by X.B. Lu; Y.P. Wang; H.Q. Ling; Z.G. Liu

Book ID
117145734
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
240 KB
Volume
303
Category
Article
ISSN
0022-3093

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✍ J. Zhu; Z.G. Liu 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 147 KB

Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat