## Abstract A conductivity dispersion has been measured at very low frequencies (VLF) on several concentrated DNA solutions. By measuring simultaneously their electric birefringence decay, it is shown that the dielectric relaxation (which is related to the conductivity dispersion) is due to the mol
Dielectric characterization of relaxation and curing behavior of oriental lacquer
β Scribed by J. W. Hong; H. K. Kim; J. O. Choi
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 156 KB
- Volume
- 76
- Category
- Article
- ISSN
- 0021-8995
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β¦ Synopsis
Dielectric analysis was used to investigate the effects of temperature and humidity on the curing behavior of oriental lacquer and to characterize the dielectric properties of the lacquer film. It was found that the oriental lacquer could not cure to its hardened state at relative humidity less than 50% in ambient temperature and that the cure time could be shortened tremendously by increasing the curing temperature. In order to study the dielectric properties of oriental lacquer film, two films were prepared at different curing temperatures. The glass transition and secondary relaxation temperatures of ordinary oriental lacquer film, room temperature cured purified lacquer, were observed at 45 and Οͺ40Β°C, respectively. The high temperature cured purified lacquer film showed a secondary relaxation at around Οͺ50Β°C. The relationship between thermodynamic properties and chemical structures was explored based on the analysis of the dielectric relaxation behavior using Cole-Cole plots and the dielectric relaxation intensity β¬β.
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## Abstract This work was performed to investigate the curing behaviors of Korean __Dendropanax__ lacquer and to determine its sufficient curing conditions. In FTIR and AFM analyses, the peak area of Cο£ΎC (1644 cm^β1^) and the microadhesion decreased with increasing curing time, attributed to oxidat