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Diamond deposition in a bell-jar reactor: influence of the plasma and substrate parameters on the microstructure and growth rate

✍ Scribed by Gicquel, A.; Anger, E.; Ravet, M.F.; Fabre, D.; Scatena, G.; Wang, Z.Z.

Book ID: 122656252
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 821 KB
Volume: 2
Category: Article
ISSN: 0925-9635
DOI: 10.1016/0925-9635(93)90094-I

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## Abstract The use of diamond as a material for high power electronics requires high‐purity monocrystalline thick diamond films. Hence it is extremely important to have perfect control of the morphology during the entire growth process, so that the useable surface be maximized and residual stresse