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Diamond deposition at low substrate temperatures

✍ Scribed by W.A. Yarbrough; A.R. Badzian; D. Pickrell; Y. Liou; A. Inspektor

Book ID
108342170
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
493 KB
Volume
99
Category
Article
ISSN
0022-0248

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Growth of nanocrystalline diamond films
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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea