𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Development of Xe and Sn discharge EUV light source

✍ Scribed by Kishi, N; Iizuka, N; Jiang, F; Orishimo, S; Kawamura, T; Horioka, K; Watanabe, M; Okino, A; Hotta, E


Book ID
120592347
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
427 KB
Volume
112
Category
Article
ISSN
1742-6588

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Comparison of laser produced and gas dis
✍ R. Lebert; K. Bergmann; G. Schriever; W. Neff πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 309 KB

Pulsed plasmas, e.g., laser produced plasma (LPP) and gas discharge based pinch plasmas are known as intense sources of soft x-ray and extreme ultraviolet (EUV) radiation in the wavelength interval of about 1 um to beyond 50 nm. They can be generated in compact, laboratory scale devices. Both scheme