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Development of a freestanding copper antiscatter grid using deep X-ray lithography

โœ Scribed by O. V. Makarova; C.-M. Tang; D. C. Mancini; N. Moldovan; R. Divan; D. G. Ryding; R. H. Lee


Book ID
106184572
Publisher
Springer-Verlag
Year
2003
Tongue
English
Weight
692 KB
Volume
9
Category
Article
ISSN
0946-7076

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