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Development and Validation of the EXAm Separation Process for Single Am Recycling

✍ Scribed by Christine Rostaing; Christophe Poinssot; Dominique Warin; Pascal Baron; Brigitte Lorraina


Book ID
119352799
Publisher
Elsevier
Year
2012
Weight
140 KB
Volume
7
Category
Article
ISSN
1876-6196

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A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material