SF6-sensitized dissociation of UF6 with
โ
Chin Chi-tsung; Hou Hui-qi; Bao Yi-han; Li Ting-hua
๐
Article
๐
1983
๐
Elsevier Science
๐
English
โ 395 KB
The dissociation of UFe sensitized by SFe excited with a pulsed CO\* laser in the presence of Iis and Co as scavc~ge~s has been investigated. in the SF~--UF~-HZ system the dissociation yieIds have been determined as a function of the laser frezyncy, the fluence. and Hs partial pressure. A masimum di