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Determination of tunnel mass and physical thickness of gate oxide including poly-Si/SiO2 and Si/SiO2 interfacial transition Layers

✍ Scribed by Watanabe, H.; Matsushita, D.; Muraoka, K.


Book ID
114618282
Publisher
IEEE
Year
2006
Tongue
English
Weight
496 KB
Volume
53
Category
Article
ISSN
0018-9383

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