## Abstract The valence band offset (VBO) at a InN/In~0.3~Ga~0.7~N(0001) as well as HfO~2~/InN(0001) heterojunction is investigated by X‐ray photoelectron spectroscopy using monochromated AlKα radiation. The InN and In~0.3~Ga~0.7~N films were grown using plasma‐assisted molecular beam epitaxy, wher
Determination of MBE grown wurtzite GaN/Ge3N4/Ge heterojunctions band offset by X-ray photoelectron spectroscopy
✍ Scribed by Mahesh Kumar; Mohana K. Rajpalke; Basanta Roul; Thirumaleshwara N. Bhat; A. T. Kalghatgi; S. B. Krupanidhi
- Publisher
- John Wiley and Sons
- Year
- 2011
- Tongue
- English
- Weight
- 287 KB
- Volume
- 249
- Category
- Article
- ISSN
- 0370-1972
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✦ Synopsis
Abstract
Hexagonal Ge~3~N~4~ layer was prepared on Ge surface by in situ direct atomic source nitridation and it is promising buffer layer to grow GaN on Ge (111). The valence band offset (VBO) of GaN/Ge~3~N~4~/Ge heterojunctions is determined by X‐ray photoemission spectroscopy. The valence band (VB) of Ge~3~N~4~ is found to be 0.38 ± 0.04 eV above the GaN valance band and 1.14 ± 0.04 eV below the Ge. The GaN/Ge~3~N~4~ and Ge~3~N~4~/Ge are found type‐II and type‐I heterojunctions, respectively. The exact measurements of the VBO and conduction band offset (CBO) are important for use of GaN/Ge~3~N~4~/Ge (111) heterosystems.
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