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Design, fabrication, and characterization of deep-etched waveguide gratings

✍ Scribed by Kleckner, T.C.; Modotto, D.; Locatelli, A.; Mondia, J.P.; Linden, S.; Morandotti, R.; De Angelis, C.; Stanley, C.R.; van Driel, H.M.; Aitchison, J.S.


Book ID
115371524
Publisher
Optical Society of America
Year
2005
Tongue
English
Weight
415 KB
Volume
23
Category
Article
ISSN
0733-8724

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## Abstract InGaAsP/InP micro‐waveguides are fabricated by a deep (>3 ΞΌm) Reactive Ion Etching. The devices losses are measured by the Fabry–Perot technique for guide width contained between 10 ΞΌm and 0.5 ΞΌm. The measured losses range from 2 dB/mm to 14 dB/mm. Β© 2004 Wiley Periodicals, Inc. Microwa