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Design and optimization of site-by-site alignment marks for a single polysilicon bipolar process

✍ Scribed by Egil D. Castel; Nader Shamma

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 697 KB
Volume: 9
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(89)90016-6

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Design and optimization of site-by-site

Design and optimization of site-by-site alignment marks for a single polysilicon bipolar process: E.D. Castel, N. Shamma (Nat. Semicond. Corp., Santa Clara, CA. USA) Microelectron. Eng. (Netherlands), vol. 9, no. 1–4. p. 73–77 (May 1989). (14th International Conference on Microlithography/Microcircuit Engineering 88, Vienna, Austria, 20–22 Sept. 1988)

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 81 KB