Design and optimization of site-by-site alignment marks for a single polysilicon bipolar process: E.D. Castel, N. Shamma (Nat. Semicond. Corp., Santa Clara, CA. USA) Microelectron. Eng. (Netherlands), vol. 9, no. 1–4. p. 73–77 (May 1989). (14th International Conference on Microlithography/Microcircuit Engineering 88, Vienna, Austria, 20–22 Sept. 1988)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 81 KB
• Volume: 21
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/0026-2692(90)90090-p