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Depth profiling of surface oxidized TiAlN film by synchrotron radiation excited X-ray photoelectron spectroscopy

✍ Scribed by F. Esaka; K. Furuya; H. Shimada; M. Imamura; N. Matsubayashi; T. Sato; A. Nishijima; T. Kikuchi; A. Kawana; H. Ichimura

Book ID: 117217050
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 383 KB
Volume: 377-379
Category: Article
ISSN: 0039-6028
DOI: 10.1016/s0039-6028(96)01350-7

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