Deposition temperature dependence of electrical instability in an InP metal-insulator-semiconductor capacitor provided by plasma-enhanced chemical vapour deposited silicon nitride

✍ Scribed by M. B. Lee; I. K. Han; Y. J. Lee; J. I. Lee; K. N. Kang; H. Lim

• Publisher: Springer
• Year: 1993
• Tongue: English
• Weight: 195 KB
• Volume: 12
• Category: Article
• ISSN: 0261-8028
• DOI: 10.1007/bf00241857