Deposition rate and temperature of carbon films during laser-induced CVD on a moving substrate

✍ Scribed by King Hong Kwok; Wilson K.S Chiu

• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 390 KB
• Volume: 41
• Category: Article
• ISSN: 0008-6223
• DOI: 10.1016/s0008-6223(03)00286-0

✦ Synopsis

The feasibility of using pyrolytic laser-induced chemical vapor deposition (LCVD) to deposit carbon coatings on moving fused quartz substrates is investigated. This LCVD system uses a CO laser to locally heat a substrate in open air to create a 2 hot spot. Pyrolysis of hydrocarbon species occurs and subsequently deposits a layer of carbon film onto the substrate surface. The results of this study indicate that growth kinetics and the geometry of uniform carbon stripes deposited by pyrolytic LCVD strongly related to the laser power, the traverse velocity of the substrate, the type of hydrocarbon species used in deposition, and the diameter of the substrate. The deposition rate of carbon film increases exponentially with the laser power, while an increase in traverse velocity of the substrate will also increase the deposition rate until a maximum deposition rate is reached; further increases in the traverse velocity will decrease the deposition rate. We suspect that this optimal deposition rate is caused by substrate motion, which affects the substrate surface temperature, and consequently the effective surface area available for film deposition. The substrate temperature is observed to behave linearly with the deposition parameters considered in this study.