Deposition rate and morphology of electroless copper film from solutions containing 2,2′-dipyridyl
✍ Scribed by Masahiro Oita; Masao Matsuoka; Chiaki Iwakura
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 516 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0013-4686
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✦ Synopsis
Crystal structure and surface morphology of electroless copper films deposited from solutions containing 2,2'-dipyridyl were investigated by X-ray diffraction and electron microscopic observations. The deposition rate of copper was remarkably affected by bath temperature and 2.2'-dipyridyl concentration. Although CuzO was codeposited in the copper film prepared at 30' C, pure metallic copper was obtained at 70-C regardless of dissolved 0:. The surface morphology of the copper deposit plated at 30 C exhibited a fine grain structure, while a coarse grain structure was observed for the copper deposit plated at 70 C. Changes in crystal structure and surface morphology of the copper films are discussed as a function of deposition rate.
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