Deposition Process of Amorphous Boron Carbide from CH[sub 4]∕BCl[sub 3]∕H[sub 2] Precursor

✍ Scribed by Berjonneau, J.; Chollon, G.; Langlais, F.

• Book ID: 118006911
• Publisher: The Electrochemical Society
• Year: 2006
• Tongue: English
• Weight: 174 KB
• Volume: 153
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2353566