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Deposition of transparent and conductive ZnO films by an atmospheric pressure plasma-jet-assisted process

✍ Scribed by Hsu, C.M.; Lien, S.T.; Yang, Y.J.; Chen, J.Z.; Cheng, I.C.; Hsu, C.C.

Book ID
121803785
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
973 KB
Volume
570
Category
Article
ISSN
0040-6090

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## Abstract Transparent conducting ZnO films are deposited by plasma assisted deposition technique on glass and plastic substrates at temperatures 60 ∼ 300 Β°C using metallic Zn, metallic Ga and plasma‐excited oxygen as source materials. Deposited films were characterized by X‐ray diffraction (XRD),