Deposition of Silver Thin Films Using the Pyrazolate Complex [Ag(3,5-(CF3)2C3HN2)]3

✍ Scribed by Y. Chi; E. Lay; T.-Y. Chou; Y.-H. Song; A. J. Carty

• Book ID: 102814635
• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 553 KB
• Volume: 11
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/cvde.200406351

✦ Synopsis

The synthesis and characterization of a series of silver pyrazolate complexes [Ag(tfpz)] 3 (1), [Ag(fbpz)] 3 (2), [Ag(dbpz)] 3 (3), and [(py)Ag(tfpz)] 2 (4) are reported, for which tfpz, fbpz, dbpz are abbreviations for the pyrazolate ligands with formulae 3,5-(CF 3 ) 2pz, 3-t Bu-5-(CF 3 )-pz, and 3,5-( t Bu) 2 -pz, respectively. These silver complexes were characterized by microanalysis and spectroscopic methods. The CF 3 -substituted complex 1 possesses the highest volatility and stability against thermal decomposition. Low pressure CVD experiments were conducted over the temperature range 250±350 C. Silver metal thin films were successfully obtained on silicon wafers using pure H 2 as the carrier gas. Scanning electron microscopy (SEM) was used to reveal surface morphologies, while X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were utilized to determine the atomic composition of the as-deposited thin films as well as the crystallite packing.