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Deposition of silicon films in presence of nitrogen plasma—A feasibility study

✍ Scribed by Sheetal J. Patil; Dhananjay S. Bodas; G. J. Phatak; S. A. Gangal


Book ID
110644131
Publisher
Springer-Verlag
Year
2002
Tongue
English
Weight
82 KB
Volume
25
Category
Article
ISSN
0250-4707

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