Deposition of device grade poly-Si films on glass substrate directly at 450 °C and fabrication of bottom-gate poly-Si TFTs

✍ Scribed by C. Lim; J.W. Lee; J. Hanna

• Book ID: 116671037
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 589 KB
• Volume: 354
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/j.jnoncrysol.2007.10.082