Deposition of carbon films with diamond properties

✍ Scribed by S. Aisenberg; R. Chabot

• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 141 KB
• Volume: 10
• Category: Article
• ISSN: 0008-6223
• DOI: 10.1016/0008-6223(72)90523-4

✦ Synopsis

ABSTRACTS

191. Deposition of carbon films with diamond properties

S. Aisenberg and R. Chabot (Space Sciences Division, Whittaker Corporation, Waltham, Massachusetts). An ion beam deposition technique has been developed and used to deposit thin films of diamond-like carbon on room temperature substrates. Film properties include (1) transparency, (2) index of refraction greater than 2.0, (3) highly insulating, (4) able to scratch glass, (5) resistant to HF (6) lattice constant similar to diamond, (7) dielectric constant between 8 and 14, (8) radiation resistance, (9) resistant to sodium ion diffusion. Applications in semiconductor technology and as wear-resistant coatings are anticipated.