Deposition of amorphous CNx by d.c. and rf plasma sputtering using a rf radical nitrogen beam source

✍ Scribed by Hayashi, Y.; Rahman, M.M.; Kaneko, K.; Soga, T.; Umeno, M.; Jimbo, T.

• Book ID: 121895880
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 105 KB
• Volume: 11
• Category: Article
• ISSN: 0925-9635
• DOI: 10.1016/S0925-9635(02)00013-4