Deposition characteristics of Ti−Si−N films reactively sputtered from various targets in a N2/Ar gas mixture

✍ Scribed by W. H. Lee; S. K. Park; B. J. Kang; P. J. Reucroft; J. G. Lee

• Book ID: 107452656
• Publisher: Springer US
• Year: 2001
• Tongue: English
• Weight: 160 KB
• Volume: 30
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-001-0104-1