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Deposition and study of CVD—tungsten and molybdenum thin films and their impact on microelectronics technology

✍ Scribed by K.A. Gesheva; T.A. Krisov; U.I. Simkov; G.D. Beshkov


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
312 KB
Volume
73
Category
Article
ISSN
0169-4332

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